主要技术参数与配置：

1.真空室容积：φ1100*1200mm

2.有效镀膜区：φ700*850mm

3.可移出式转架：无需定位，可任意位置移出，传动可靠（专利技术）

4.阴极电弧：φ160mm或φ140mm双驱动动态磁控阴极电弧*12

5.IET离子刻蚀源：1套

Configuration：

Ⅰ.Vacuum chamber volume：Φ1100mm*h1200mm

Ⅱ.Effective coating area:Φ700*850mm

Ⅲ.Carousel：Removable

Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*12

Ⅴ.IET *1技术特点：

该设备在PVD1012硬质涂层设备（8弧）的基础上进行升级，阴极电弧的数量升级为12个（3组）。可制备更多膜系。多种工艺选择，可满足用户的各种需求。PVD1112的设计让现场维护和保养十分方便，系统可以从两侧打开，所有系统部件都伸手可及。

Technical feature:

The equipment is upgraded on the basis of PVD1012 hard coating equipment (8 arcs), and the number of cathode arcs is upgraded to 12 (3 sets).More coating type are available. A variety of process options can meet the needs of users.The design of PVD1112 is very convenient for on-site maintenance. The system can be opened from both sides, and all the components of the system can be reached.